Product specification
SPECIFICATIONS
Deep UV core material · NPSs / AlN epitaxial wafer / template
WAlN-NS400
≥ 5 μm,(002) ≤ 200 arcsec,(102) ≤ 200 arcsec
Hubei DUVTek Co., Ltd.
Hubei DUVTek Co., LTD.
B08, East Lake high tech creative city, Phoenix Road, 9, Wu Tong Hu, Ezhou, Hubei
Building B08, Donghu High-tech Innovation City, No. 9 Fenghuang Avenue, Wutong Lake New District, Ezhou, Hubei, China
Performance properties | Parameter value |
---|---|
Diameter | 2 inch (50.8±0.05 μm) |
Substrate type | NPSS (Nanopattern Sapphire Substrate) |
Substrate thickness | 430±20 μm |
Epilayer thickness | ≥ 5 μm |
(002) crystal quality (FWHM of 002 XRC) | ≤ 200 arcsec |
(102) crystal quality (FWHM of 102 XRC) | ≤ 200 arcsec |
Front side roughness | ≤ 1 nm |
Edge exclusion | ≤ 3 mm |
Through crack | none |
Surface orientation of a-plane | 0°±0.1° |
Surface orientation of m-plane | 0.2°±0.1° |
Primary flat orientation | a-plane±0.1° |
Primary flat length | 16±1 mm |
Back side roughness | 0.8±0.2 μm |